A synthesis technique for plasmonic array of silver nanoparticles is developed. Double absorption band (260 nm and 360 nm) UV-Vis filter based on plasmon resonance of functionalized silver nanoparticles array is realized. The dependence of prototype attenuation characteristics on synthesis parameters is investigated utilizing Electronic Absorption Spectroscopy technique. The possibility of achieving a sufficient level of optical attenuation (up to 40 dB) by producing an array of plasmonic nanoparticles with less variations in size and less fractality while increasing anodizing current density of silicon matrix. The superiority of plasmon filter over interference filter in terms of adjustment of attenuation band position is revealed.